About AXIC, Inc.
AXIC, Inc. was founded in 1980 to provide x-ray measurement of semiconductor thin films. AXIC's patented technology of combining EDX and WDX detectors for XRF analysis demonstrated significant advantage for a broad range applications. AXIC's laser ellipsometry products added AXIC's metrology capability by measuring transparent thin films or thin film stacks. AXIC also provides plasma systems for etching and deposition of thin films using either barrel, RIE, or ICP methods. AXIC has manufactured thousands of systems since its inception and has a cadre of satisfied customers. AXIC systems are sold worldwide through a network of agents and representatives. Specialties Plasma Etch, PEVCD, RIE, ICP, DRIE, XRF, Ellipsometry, Plasma, CVD, Thin Film Metrology
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